| Equipment: | Ⅱ-301(3) - ３元スパッタリング成膜装置/TS-DC・RF303|RF Plasma Sputtering Apparatus/TS-DC・RF303 |
| Start Time: | 2019/03/12 15:00 |
| End Time: | 2019/03/14 19:00 |
| Duration: | 52 hours |
| Created By: | Son Minkyu (son_minkyu) |
| PI: | |
| Email address: | |
| Tel: | |
| Usage record (Experimental conditions etc.): |
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| Type: | 光エネルギー変換分子デバイス|Molecular Photoconversion Devices |
| Last Updated: | 10:32:51 - Friday 08 March 2019 |
| tel: | 6744 |