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Equipment: Ⅱ-301(3) - 3元スパッタリング成膜装置/TS-DC・RF303|RF Plasma Sputtering Apparatus/TS-DC・RF303
Start Time: 2019/09/04 12:00
End Time: 2019/09/04 20:00
Duration: 8 hours
Created By: Son Minkyu (son_minkyu)
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(Experimental conditions etc.):
Type: 光エネルギー変換分子デバイス|Molecular Photoconversion Devices
Last Updated: 17:46:46 - Tuesday 03 September 2019
tel: 6744
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