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Ar Cluster Ion Beam XPS/PHI5000VersaProbeⅡ [ -1 ]

Detail information

Equipment information Maker:
アルバックファイ/ULVACΦ

Specs:
XPS (X-ray Photoelectron Spectroscopy) is for the elemental analysis of a specimen and can measure elemental compositions, chemical and electronic state quantitatively. In this equipment, Ar cluster ion beam system is attached to etch the sample surface mildly for intentionally exposure of deeper layers of the sample in depth-profiling XPS.

[Specifications]
●Minimum X-ray Beam Size: < 10μm
●Minimum Energy Resolution: < 0.50 eV (Ag3d 5/2)
●Maximum Sensitivity: > 1,000,000cps above background (Ag3d 5/2)
●Options: Ar Gas Cluster Ion Beam Gun (GCIB), C60 Ion Gun, Dual Anode X-ray Source, Ultra Violet Source (UPS), Sample Transfer Vessel, Hot/Cold Stage, Scanning Auger Microscopy, etc.


Location:
301 at I2CNER buildingⅡ

Other information:


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Support information Customer service:
営業担当:アルバックファイ㈱ 国内営業部 専門部長 辻野勇
tel:0467-85-4220
E-mail:isamu_tsujino@ulvac.com
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Person in charge shigenori_fujikawa, ken_kojio


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[Contact]
以下のURLより、各部門の汎用機器担当者をご確認ください。
Please refer to the URL below to find the responsible person in your group and thrust.

http://i2cner.kyushu-u.ac.jp/equipment/uploads/20201221095247uploads_3_%E6%B1%8E%E7%94%A8%E8%A3%85%E7%BD%AE%E6%8B%85%E5%BD%93%E8%80%85%E4%B8%80%E8%A6%A7_Responsible%20person%20in%20a%20group%20and%20a%20thrust.pdf

[Note]
XPS新規ユーザーはX線登録が必要です。(ガラスバッジ不要)
手続きに関しては、支援部門"iq-kenkyu@jimu.kyushu-u.ac.jp"(担当:野上・柏木)にお問い合わせ下さい。
Any NEW user of XPS, needs to be registered as RI user. (Dosimeter is NOT required.)
For the detail, please contact to Administrative Office (Nogami,Kashiwagi) "iq-kenkyu@jimu.kyushu-u.ac.jp".
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